Ultra High Vacuum Chemical Vapor Deposition Techniques for Economic Growth of Silicon Nanowires

Rashad Filfilan; Maha Khayyat

doi:doi:10.11648/j.ajn.20210702.12

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Ultra High Vacuum Chemical Vapor Deposition Techniques for Economic Growth of Silicon Nanowires

Rashad Filfilan, Maha Khayyat

Published in American Journal of Nanosciences (Volume 7, Issue 2)

Received: 23 July 2021 Accepted: 6 August 2021 Published: 11 August 2021

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Abstract

Ultra High Vacuum Chemical Vapor Deposition (UHVCVD) reactor has been used to grow silicon nanowires via innovative economical approaches using chemical active materials as catalysts such as aluminum. Scanning Electron Microscopy has been used to study the success of the growth for further investigations and advanced applications such as solar cells. Solar manufacturers are looking for approaches to improve yield and cell efficiency and lower manufacturing costs overall. One of the main goals of this project is to tear down the various parameters involved in the current photovoltaic panels and improve it in one or more directions (properties, performance, costs). The current study is addressing the solar market with special concern of the efficiency goal. The mechanical flexibility of plastic materials is of high demands for all photovoltaic applications onto curved surfaces for architectural integration. Polycarbonate AND/OR poly methyl methacrylate encapsulation of photovoltaic modules and usage to fabricate advanced silicon nanowires solar cells can be emerging technologies delivering excellent performance and durability at a competitive cost. Although solar panels with glass protective facing still account for the majority of the installations of photovoltaic modules, however, it is expected that the adaptation of these new technologies will rapidly gain market share. The growth of silicon nanowires using chemical vapor deposition to fabricate advanced solar cells can be done via two innovative approaches. Alternative techniques for lithographic formation of the mask can provide advantages for low-cost processing, especially where a simple repeating pattern is required.

Published in	American Journal of Nanosciences (Volume 7, Issue 2)
DOI	10.11648/j.ajn.20210702.12
Page(s)	42-48
Creative Commons	This is an Open Access article, distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution and reproduction in any medium or format, provided the original work is properly cited.
Copyright	Copyright © The Author(s), 2021. Published by Science Publishing Group

Keywords

Silicon, Nanowires, Ultra High Vacuum Chemical Vapour Deposition, Photovoltaic, Scanning Electron Microscopy

References

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Rashad Filfilan, Maha Khayyat. (2021). Ultra High Vacuum Chemical Vapor Deposition Techniques for Economic Growth of Silicon Nanowires. American Journal of Nanosciences, 7(2), 42-48. https://doi.org/10.11648/j.ajn.20210702.12

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ACS Style

Rashad Filfilan; Maha Khayyat. Ultra High Vacuum Chemical Vapor Deposition Techniques for Economic Growth of Silicon Nanowires. Am. J. Nanosci. 2021, 7(2), 42-48. doi: 10.11648/j.ajn.20210702.12

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AMA Style

Rashad Filfilan, Maha Khayyat. Ultra High Vacuum Chemical Vapor Deposition Techniques for Economic Growth of Silicon Nanowires. Am J Nanosci. 2021;7(2):42-48. doi: 10.11648/j.ajn.20210702.12

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@article{10.11648/j.ajn.20210702.12,
  author = {Rashad Filfilan and Maha Khayyat},
  title = {Ultra High Vacuum Chemical Vapor Deposition Techniques for Economic Growth of Silicon Nanowires},
  journal = {American Journal of Nanosciences},
  volume = {7},
  number = {2},
  pages = {42-48},
  doi = {10.11648/j.ajn.20210702.12},
  url = {https://doi.org/10.11648/j.ajn.20210702.12},
  eprint = {https://article.sciencepublishinggroup.com/pdf/10.11648.j.ajn.20210702.12},
  abstract = {Ultra High Vacuum Chemical Vapor Deposition (UHVCVD) reactor has been used to grow silicon nanowires via innovative economical approaches using chemical active materials as catalysts such as aluminum. Scanning Electron Microscopy has been used to study the success of the growth for further investigations and advanced applications such as solar cells. Solar manufacturers are looking for approaches to improve yield and cell efficiency and lower manufacturing costs overall. One of the main goals of this project is to tear down the various parameters involved in the current photovoltaic panels and improve it in one or more directions (properties, performance, costs). The current study is addressing the solar market with special concern of the efficiency goal. The mechanical flexibility of plastic materials is of high demands for all photovoltaic applications onto curved surfaces for architectural integration. Polycarbonate AND/OR poly methyl methacrylate encapsulation of photovoltaic modules and usage to fabricate advanced silicon nanowires solar cells can be emerging technologies delivering excellent performance and durability at a competitive cost. Although solar panels with glass protective facing still account for the majority of the installations of photovoltaic modules, however, it is expected that the adaptation of these new technologies will rapidly gain market share. The growth of silicon nanowires using chemical vapor deposition to fabricate advanced solar cells can be done via two innovative approaches. Alternative techniques for lithographic formation of the mask can provide advantages for low-cost processing, especially where a simple repeating pattern is required.},
 year = {2021}
}

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TY  - JOUR
T1  - Ultra High Vacuum Chemical Vapor Deposition Techniques for Economic Growth of Silicon Nanowires
AU  - Rashad Filfilan
AU  - Maha Khayyat
Y1  - 2021/08/11
PY  - 2021
N1  - https://doi.org/10.11648/j.ajn.20210702.12
DO  - 10.11648/j.ajn.20210702.12
T2  - American Journal of Nanosciences
JF  - American Journal of Nanosciences
JO  - American Journal of Nanosciences
SP  - 42
EP  - 48
PB  - Science Publishing Group
SN  - 2575-4858
UR  - https://doi.org/10.11648/j.ajn.20210702.12
AB  - Ultra High Vacuum Chemical Vapor Deposition (UHVCVD) reactor has been used to grow silicon nanowires via innovative economical approaches using chemical active materials as catalysts such as aluminum. Scanning Electron Microscopy has been used to study the success of the growth for further investigations and advanced applications such as solar cells. Solar manufacturers are looking for approaches to improve yield and cell efficiency and lower manufacturing costs overall. One of the main goals of this project is to tear down the various parameters involved in the current photovoltaic panels and improve it in one or more directions (properties, performance, costs). The current study is addressing the solar market with special concern of the efficiency goal. The mechanical flexibility of plastic materials is of high demands for all photovoltaic applications onto curved surfaces for architectural integration. Polycarbonate AND/OR poly methyl methacrylate encapsulation of photovoltaic modules and usage to fabricate advanced silicon nanowires solar cells can be emerging technologies delivering excellent performance and durability at a competitive cost. Although solar panels with glass protective facing still account for the majority of the installations of photovoltaic modules, however, it is expected that the adaptation of these new technologies will rapidly gain market share. The growth of silicon nanowires using chemical vapor deposition to fabricate advanced solar cells can be done via two innovative approaches. Alternative techniques for lithographic formation of the mask can provide advantages for low-cost processing, especially where a simple repeating pattern is required.
VL  - 7
IS  - 2
ER  -

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Author Information

Rashad Filfilan

Midra Tower, Saudi Aramco, Dhahran, Saudi Arabia
Maha Khayyat

Materials Science Research Institute, King Abdullaziz City for Science and Technology, Riyadh, Saudi Arabia

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Plain Text BibTeX RIS

APA Style

Rashad Filfilan, Maha Khayyat. (2021). Ultra High Vacuum Chemical Vapor Deposition Techniques for Economic Growth of Silicon Nanowires. American Journal of Nanosciences, 7(2), 42-48. https://doi.org/10.11648/j.ajn.20210702.12

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ACS Style

Rashad Filfilan; Maha Khayyat. Ultra High Vacuum Chemical Vapor Deposition Techniques for Economic Growth of Silicon Nanowires. Am. J. Nanosci. 2021, 7(2), 42-48. doi: 10.11648/j.ajn.20210702.12

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AMA Style

Rashad Filfilan, Maha Khayyat. Ultra High Vacuum Chemical Vapor Deposition Techniques for Economic Growth of Silicon Nanowires. Am J Nanosci. 2021;7(2):42-48. doi: 10.11648/j.ajn.20210702.12

Copy | Download

@article{10.11648/j.ajn.20210702.12,
  author = {Rashad Filfilan and Maha Khayyat},
  title = {Ultra High Vacuum Chemical Vapor Deposition Techniques for Economic Growth of Silicon Nanowires},
  journal = {American Journal of Nanosciences},
  volume = {7},
  number = {2},
  pages = {42-48},
  doi = {10.11648/j.ajn.20210702.12},
  url = {https://doi.org/10.11648/j.ajn.20210702.12},
  eprint = {https://article.sciencepublishinggroup.com/pdf/10.11648.j.ajn.20210702.12},
  abstract = {Ultra High Vacuum Chemical Vapor Deposition (UHVCVD) reactor has been used to grow silicon nanowires via innovative economical approaches using chemical active materials as catalysts such as aluminum. Scanning Electron Microscopy has been used to study the success of the growth for further investigations and advanced applications such as solar cells. Solar manufacturers are looking for approaches to improve yield and cell efficiency and lower manufacturing costs overall. One of the main goals of this project is to tear down the various parameters involved in the current photovoltaic panels and improve it in one or more directions (properties, performance, costs). The current study is addressing the solar market with special concern of the efficiency goal. The mechanical flexibility of plastic materials is of high demands for all photovoltaic applications onto curved surfaces for architectural integration. Polycarbonate AND/OR poly methyl methacrylate encapsulation of photovoltaic modules and usage to fabricate advanced silicon nanowires solar cells can be emerging technologies delivering excellent performance and durability at a competitive cost. Although solar panels with glass protective facing still account for the majority of the installations of photovoltaic modules, however, it is expected that the adaptation of these new technologies will rapidly gain market share. The growth of silicon nanowires using chemical vapor deposition to fabricate advanced solar cells can be done via two innovative approaches. Alternative techniques for lithographic formation of the mask can provide advantages for low-cost processing, especially where a simple repeating pattern is required.},
 year = {2021}
}

Copy | Download

TY  - JOUR
T1  - Ultra High Vacuum Chemical Vapor Deposition Techniques for Economic Growth of Silicon Nanowires
AU  - Rashad Filfilan
AU  - Maha Khayyat
Y1  - 2021/08/11
PY  - 2021
N1  - https://doi.org/10.11648/j.ajn.20210702.12
DO  - 10.11648/j.ajn.20210702.12
T2  - American Journal of Nanosciences
JF  - American Journal of Nanosciences
JO  - American Journal of Nanosciences
SP  - 42
EP  - 48
PB  - Science Publishing Group
SN  - 2575-4858
UR  - https://doi.org/10.11648/j.ajn.20210702.12
AB  - Ultra High Vacuum Chemical Vapor Deposition (UHVCVD) reactor has been used to grow silicon nanowires via innovative economical approaches using chemical active materials as catalysts such as aluminum. Scanning Electron Microscopy has been used to study the success of the growth for further investigations and advanced applications such as solar cells. Solar manufacturers are looking for approaches to improve yield and cell efficiency and lower manufacturing costs overall. One of the main goals of this project is to tear down the various parameters involved in the current photovoltaic panels and improve it in one or more directions (properties, performance, costs). The current study is addressing the solar market with special concern of the efficiency goal. The mechanical flexibility of plastic materials is of high demands for all photovoltaic applications onto curved surfaces for architectural integration. Polycarbonate AND/OR poly methyl methacrylate encapsulation of photovoltaic modules and usage to fabricate advanced silicon nanowires solar cells can be emerging technologies delivering excellent performance and durability at a competitive cost. Although solar panels with glass protective facing still account for the majority of the installations of photovoltaic modules, however, it is expected that the adaptation of these new technologies will rapidly gain market share. The growth of silicon nanowires using chemical vapor deposition to fabricate advanced solar cells can be done via two innovative approaches. Alternative techniques for lithographic formation of the mask can provide advantages for low-cost processing, especially where a simple repeating pattern is required.
VL  - 7
IS  - 2
ER  -

Copy | Download